Random Deposition Model with a Constant Capture Length
نویسندگان
چکیده
We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance l, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to rate/capture equations and to the analysis of the island-island distance distribution.
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تاریخ انتشار 2004